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  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Metal nitride film for thermistor, process for producing same, and thermistor sensor of film type: United States Patent

Metal nitride film for thermistor, process for producing same, and thermistor sensor of film type: United States Patent

Tanaka, Hiroshi

Paperback

General Science

Currently unavailable to order

ISBN13: 9798574577431
Publisher: Independently Published
Published: Dec 3 2020
Pages: 26
Weight: 0.19
Height: 0.05 Width: 8.50 Depth: 11.02
Language: English
Provided are a metal nitride film for a thermistor, which has an excellent bending resistance and can be directly deposited on a film or the like without firing, a method for producing the same, and a film type thermistor sensor. The metal nitride film for a thermistor, which consists of a metal nitride represented by the general formula: Ti.sub.xAl.sub.yN.sub.z (where 0.70.ltoreq.y/(x+y).ltoreq.0.95, 0.4.ltoreq.z.ltoreq.0.5, and x+y+z=1), wherein the crystal structure thereof is a hexagonal wurtzite-type single phase, and the peak ratio of the diffraction peak intensity of a-axis orientation (100) relative to the diffraction peak intensity of c-axis orientation (002) (i.e., the diffraction peak intensity of a-axis orientation (100)/the diffraction peak intensity of c-axis orientation (002)) is 0.1 or lower in X-ray diffraction.

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